BMF awarded US patent for dual-resolution optical system technology

BMF awarded US patent for dual-resolution optical system technology

Update: 2025-10-28
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Description

The patent (US Patent No. 12,420,486 B2) is titled ‘Multi-Scale Systems for Projection Micro Stereolithography.’ BMF’s microArch D1025 is the first machine to leverage the dual-resolution concept.
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BMF awarded US patent for dual-resolution optical system technology

BMF awarded US patent for dual-resolution optical system technology

Sam Davies